Content protected from screenshots
GKFix.in
General Knowledge
Categories
Concept Builder Quiz
About Us
Start Quiz
Home
My Profile
General Knowledge
Categories
Concept Builder
Start Quiz
Logout
GKFix MCQ Question
Test your knowledge and learn something new
Home
P BLOCK ELEMENTS
Question #41232
Back to Home
View All P BLOCK ELEMENTS Questions
33 Views
Question
What is the primary reason for the thermal stability of OF2 at 298 K?
A. High bond dissociation enthalpy
B. Its molecular structure and bonding characteristics
C. Presence of hydrogen bonding
D. Ionic character
Check Answer
Share on Twitter
Share on Facebook
Copy Link
Related Questions
What is the primary purpose of recycling the NO gas produced in the Ostwald process?
28
In the reaction 4HCl + O₂ → 2Cl₂ + 2H₂O (catalyzed by CuCl₂), what is the change in the ox...
13
Which interhalogen compound listed in Table 7.11 is described as existing in the liquid state at roo...
10